JPH01102464A - フォトマスク - Google Patents
フォトマスクInfo
- Publication number
- JPH01102464A JPH01102464A JP62260939A JP26093987A JPH01102464A JP H01102464 A JPH01102464 A JP H01102464A JP 62260939 A JP62260939 A JP 62260939A JP 26093987 A JP26093987 A JP 26093987A JP H01102464 A JPH01102464 A JP H01102464A
- Authority
- JP
- Japan
- Prior art keywords
- photomask
- film
- cross
- photoresist
- sectional shape
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000000758 substrate Substances 0.000 claims abstract description 24
- 229920002120 photoresistant polymer Polymers 0.000 abstract description 18
- 239000004065 semiconductor Substances 0.000 abstract description 11
- 239000011521 glass Substances 0.000 abstract description 7
- 229910052751 metal Inorganic materials 0.000 description 8
- 239000002184 metal Substances 0.000 description 8
- 229910021420 polycrystalline silicon Inorganic materials 0.000 description 8
- 238000005530 etching Methods 0.000 description 5
- 238000004519 manufacturing process Methods 0.000 description 3
- 238000000034 method Methods 0.000 description 3
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 239000011651 chromium Substances 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000005357 flat glass Substances 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
- 238000000059 patterning Methods 0.000 description 1
Landscapes
- Preparing Plates And Mask In Photomechanical Process (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP62260939A JPH01102464A (ja) | 1987-10-15 | 1987-10-15 | フォトマスク |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP62260939A JPH01102464A (ja) | 1987-10-15 | 1987-10-15 | フォトマスク |
Publications (2)
Publication Number | Publication Date |
---|---|
JPH01102464A true JPH01102464A (ja) | 1989-04-20 |
JPH0551892B2 JPH0551892B2 (en]) | 1993-08-03 |
Family
ID=17354875
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP62260939A Granted JPH01102464A (ja) | 1987-10-15 | 1987-10-15 | フォトマスク |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH01102464A (en]) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100347541B1 (ko) * | 1999-12-23 | 2002-08-07 | 주식회사 하이닉스반도체 | 반도체 소자 제조용 레티클 |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0592295U (ja) * | 1992-05-15 | 1993-12-17 | 淑朗 矢田貝 | 荷役用フォークレット及びフォークリフトの爪 |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5379387A (en) * | 1976-12-23 | 1978-07-13 | Nec Corp | Optical mask |
-
1987
- 1987-10-15 JP JP62260939A patent/JPH01102464A/ja active Granted
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5379387A (en) * | 1976-12-23 | 1978-07-13 | Nec Corp | Optical mask |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100347541B1 (ko) * | 1999-12-23 | 2002-08-07 | 주식회사 하이닉스반도체 | 반도체 소자 제조용 레티클 |
Also Published As
Publication number | Publication date |
---|---|
JPH0551892B2 (en]) | 1993-08-03 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
LAPS | Cancellation because of no payment of annual fees |